مقاله Study of Edged Topological Disordered in Carbon Nanostruct

 

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مقاله Study of Edged Topological Disordered in Carbon Nanostructures that Growth by HFCVD System in the Presence of Different Magnetic Field Intensity با word دارای 4 صفحه می باشد و دارای تنظیمات در microsoft word می باشد و آماده پرینت یا چاپ است

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سال انتشار: 1393
محل انتشار: پنجمین کنگره بین المللی نانو و فناوری نانو (ICNN2014)
تعداد صفحات: 4
چکیده:

The effects of edged topological disorder on persistent current and magnetic susceptibility are investigatedin a two-dimensional quantum ring enclosed within a magnetic flux in tight binding model. In this research work, we have investigated the effects of magnetic field with different intensity on growth of carbon nanostructures (CNS) by using HFCVD system. In this work, Si (100) p-type is used as a substrate; Fe was selected as ferromagnetic thin film that coated on the substrates by DC sputtering technique. The intensities of magnetic field which used in this study were selected in four different values as B=0 mT, B=2.85 mT, B=3.94 mT and B=5.28 mT. AFM technique, FESEM method and Raman spectroscopy were used to showing the morphology of thin films and the characterization of CNS properties. This research show that changing the intensity of magnetic fields, leads to a periodical varying in the values of crystallite size (La) from 16.81 to 20.14 then 14.12 and 19.80 respectively. Because of edged topological disorder ring under magnetic flux, this graph was periodic. Also these changes have some effects on the morphologies of the DLC thin films. The sharpest of these structures is obtained by using of high magnetic field intensity.

 

 

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